Titre | Access to residual carrier concentration in ZnO nanowires by calibrated scanning spreading resistance microscopy |
Type de publication | Journal Article |
Year of Publication | 2016 |
Auteurs | Wang, L., J. M. Chauveau, R. Brenier, V. Sallet, F. Jomard, C. Sartel, and G. Brémond |
Journal | Applied Physics Letters |
Volume | 108 |
Ticket | 13 |
Pagination | 132103 |
Date Published | Apr-03-2018 |
ISSN | 0003-6951 |
DOI | 10.1063/1.4945100 |
Short Title | Appl. Phys. Lett. |