Consortium Lyon Saint-Etienne de Microscopie (FED 4092)
Lateral growth of NiSi at the θ-Ni2Si/Si(100) interface: Experiments and modelling
By administrateur on Sat, 12/28/2019 - 20:50
| Title | Lateral growth of NiSi at the θ-Ni2Si/Si(100) interface: Experiments and modelling |
| Publication Type | Journal Article |
| Year of Publication | 2018 |
| Authors | Mangelinck, D., E. M. Kousseifi, K. Hoummada, F. Panciera, and T. Epicier |
| Journal | Microelectronic Engineering |
| Volume | 199 |
| Pagination | 45 - 51 |
| Date Published | Jan-11-2018 |
| ISSN | 01679317 |
| DOI | 10.1016/j.mee.2018.07.014 |
| Short Title | Microelectronic Engineering |
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