| Titre | Access to residual carrier concentration in ZnO nanowires by calibrated scanning spreading resistance microscopy |
| Type de publication | Journal Article |
| Year of Publication | 2016 |
| Auteurs | Wang, L., J. M. Chauveau, R. Brenier, V. Sallet, F. Jomard, C. Sartel, and G. Brémond |
| Journal | Applied Physics Letters |
| Volume | 108 |
| Ticket | 13 |
| Pagination | 132103 |
| Date Published | Apr-03-2018 |
| ISSN | 0003-6951 |
| DOI | 10.1063/1.4945100 |
| Short Title | Appl. Phys. Lett. |